Abstract

We compare the optical properties, chemical composition, and crystallinity of silicon microstructures formed in the presence of SF6 by femtosecond laser irradiation and by nanosecond laser irradiation. In spite of very different morphology and crystallinity, the optical properties and chemical composition of the two types of microstructures are very similar. The structures formed with femtosecond (fs) pulses are covered with a disordered nanocrystalline surface layer less than 1 μm thick, while those formed with nanosecond (ns) pulses have very little disorder. Both ns-laser-formed and fs-laser-formed structures absorb near-infrared (1.1–2.5 μm) radiation strongly and have roughly 0.5% sulfur impurities.

Keywords

FemtosecondMaterials scienceNanosecondCrystallinityLaserSiliconNanocrystalline materialIrradiationMicrostructureImpurityOptoelectronicsOpticsNanotechnologyChemistryComposite material

Affiliated Institutions

Related Publications

Publication Info

Year
2004
Type
article
Volume
84
Issue
11
Pages
1850-1852
Citations
397
Access
Closed

External Links

View on DOI.org

Social Impact

Altmetric
PlumX Metrics

Social media, news, blog, policy document mentions

Citation Metrics

397
OpenAlex

Cite This

Catherine H. Crouch, James E. Carey, Jeffrey M. Warrender et al. (2004). Comparison of structure and properties of femtosecond and nanosecond laser-structured silicon. Applied Physics Letters , 84 (11) , 1850-1852. https://doi.org/10.1063/1.1667004

Identifiers

DOI
10.1063/1.1667004