Nobel Lecture: Growth of GaN on sapphire via low-temperature deposited buffer layer and realization of <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mi>p</mml:mi></mml:math>-type GaN by Mg doping followed by low-energy electron beam irradiation

2015 Reviews of Modern Physics 123 citations

Abstract

This is a personal history of one of the Japanese researchers engaged in developing a method for growing GaN on a sapphire substrate, paving the way for the realization of smart television and display systems using blue LEDs. The most important work was done in the mid to late 1980s. The background to the author's work and the process by which the technology enabling the growth of GaN and the realization of $p$-type GaN was established are reviewed.

Keywords

Realization (probability)SapphirePhysicsSubstrate (aquarium)OptoelectronicsLayer (electronics)Light-emitting diodeNanotechnologyOpticsMaterials scienceMathematicsStatisticsBiology

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Publication Info

Year
2015
Type
article
Volume
87
Issue
4
Pages
1133-1138
Citations
123
Access
Closed

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Hiroshi Amano (2015). Nobel Lecture: Growth of GaN on sapphire via low-temperature deposited buffer layer and realization of <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mi>p</mml:mi></mml:math>-type GaN by Mg doping followed by low-energy electron beam irradiation. Reviews of Modern Physics , 87 (4) , 1133-1138. https://doi.org/10.1103/revmodphys.87.1133

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DOI
10.1103/revmodphys.87.1133