Abstract

A transmission electron microscopy study of porous silicon reveals that pores selectively propagate in the 〈100〉 crystallographic directions on both n- and p-type silicon, independent of dopant concentration or anodization conditions.

Keywords

Transmission electron microscopySiliconPorous siliconMaterials scienceDopantElectron microscopeAnodizingPorosityPorous mediumCrystallographyChemical physicsChemical engineeringNanotechnologyOptoelectronicsComposite materialDopingChemistryOpticsAluminiumPhysics

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Publication Info

Year
1989
Type
article
Volume
55
Issue
7
Pages
675-677
Citations
128
Access
Closed

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S.-F. Chuang, Scott D. Collins, R. L. Smith (1989). Preferential propagation of pores during the formation of porous silicon: A transmission electron microscopy study. Applied Physics Letters , 55 (7) , 675-677. https://doi.org/10.1063/1.101819

Identifiers

DOI
10.1063/1.101819