Thermal stability of Ti3SiC2 thin films

Jens Emmerlich; Denis Mušić; Per Eklund; O. Wilhelmsson; Ulf Jansson; Jochen M. Schneider; Hans Högberg; Lars Hultman

doi:10.1016/j.actamat.2006.10.010

Keywords

Materials scienceAnnealing (glass)Transmission electron microscopyX-ray photoelectron spectroscopyThermal stabilityThin filmDiffractionScanning electron microscopeCrystallographyAnalytical Chemistry (journal)Composite materialOpticsChemical engineeringNanotechnology

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Publication Info

Year: 2006
Type: article
Volume: 55
Issue: 4
Pages: 1479-1488
Citations: 222
Access: Closed

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APA Style

                            
                                
                                    Jens Emmerlich, 
                                
                                    Denis Mušić, 
                                
                                    Per Eklund
                                
                                et al.
                            
                            (2006). 
                            Thermal stability of Ti3SiC2 thin films. 
                            Acta Materialia
                            , 55
                            (4)
                            , 1479-1488.
                            https://doi.org/10.1016/j.actamat.2006.10.010
                        

Identifiers

DOI: 10.1016/j.actamat.2006.10.010