Abstract

We present results of ab initio calculations for the structure and energetics of boron-interstitial clusters in Si and a respective continuum model for the nucleation, growth, and dissolution of such clusters. The structure of the clusters and their possible relationship to boron precipitates and interstitial-cluster formation are discussed. We find that neither the local-density approximation nor the generalized-gradient approximation to the density-functional theory result in energetics that predict annealing and activation experiments perfectly well. However, gentle refitting of the numbers results in a model with good predictive qualities.

Keywords

NucleationAb initioBoronCluster (spacecraft)SiliconAnnealing (glass)Local-density approximationDensity functional theoryEnergeticsMaterials scienceCluster analysisAb initio quantum chemistry methodsChemical physicsThermodynamicsDissolutionChemistryMolecular physicsComputational chemistryPhysical chemistryPhysicsMoleculeMetallurgyMathematics

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Publication Info

Year
2000
Type
article
Volume
77
Issue
13
Pages
2018-2020
Citations
89
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Xiangyang Liu, Wolfgang Windl, Michael P. Masquelier (2000). <i>Ab initio</i> modeling of boron clustering in silicon. Applied Physics Letters , 77 (13) , 2018-2020. https://doi.org/10.1063/1.1313253

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DOI
10.1063/1.1313253