Ultralow contact resistance between semimetal and monolayer semiconductors

Pin‐Chun Shen; Cong Su; Yuxuan Lin; Ang‐Sheng Chou; Chao-Ching Cheng; Ji Hoon Park; Ming‐Hui Chiu; Ang‐Yu Lu; Hao‐Ling Tang; Mohammad Mahdi Tavakoli; Gregory Pitner; Xiang Ji; Zhengyang Cai; Nannan Mao; Jiangtao Wang; Vincent Tung; Ju Li; Jeffrey Bokor; Alex Zettl; Chih‐I Wu; Tomás Palacios; Lain‐Jong Li; Jing Kong

doi:10.1038/s41586-021-03472-9

Keywords

Ohmic contactMonolayerSemiconductorContact resistanceSchottky barrierMaterials scienceTransistorOptoelectronicsBismuthSiliconNanotechnologySchottky diodeCondensed matter physicsElectrical engineeringDiodePhysicsLayer (electronics)

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Publication Info

Year: 2021
Type: article
Volume: 593
Issue: 7858
Pages: 211-217
Citations: 1198
Access: Closed

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APA Style

                            
                                
                                    Pin‐Chun Shen, 
                                
                                    Cong Su, 
                                
                                    Yuxuan Lin
                                
                                et al.
                            
                            (2021). 
                            Ultralow contact resistance between semimetal and monolayer semiconductors. 
                            Nature
                            , 593
                            (7858)
                            , 211-217.
                            https://doi.org/10.1038/s41586-021-03472-9
                        

Identifiers

DOI: 10.1038/s41586-021-03472-9