Scaling the Si MOSFET: from bulk to SOI to bulk
Scaling the Si MOSFET is reconsidered. Requirements on subthreshold leakage control force conventional scaling to use high doping as the device dimension penetrates into the dee...
Publications
1 shownFrequent Co-Authors
Researcher Info
- h-index
- 1
- Publications
- 1
- Citations
- 879
- Institution
- Nokia (United States)
External Links
Identifiers
- ORCID
- 0000-0001-9946-3889
Impact Metrics
h-index
1
h-index: Number of publications with at least h citations each.